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19 Electron Microscopy Laboratory The Electron Microscopy Laboratory EML is a user facility dedicated to materials char- acterization using as its primary tools electron and optical microscopy. EML is a radio- logical materials area RMA permitting work to be performed with both radioactive and non-radioactive materials. A portion of the laboratory is dedicated to sample preparation providing the researcher with facilities support equipment safety systems and proce- dures to prepare samples of diverse materials for analysis. The examination capabilities listed below are available to NSUF users. JEOL JSM-7000f scanning electron microscope Schottky field emission gun Secondary electron imaging Backscattered electron imaging in compositional and topography imaging modes Accelerating voltages from 50 volts to 30 kilovolts Probe currents on the order of 10-12 to 210-7 A Magnification ranges from 10X to 500000X Resolutions of SE images 1.2 nm at 15 kV and 3 nm at 1 kV Resolu- tion in analysis 3 nm at 15 kV probe current of 5 nA and WD of 10 mm Equipped with Oxford EDS and WDS Specimen tilt ranges from -5 to 70 degrees Available specimen holders include 12.5 dia 10 H mm and 32 dia 20 H mm. JEOL JEM 2010 scanning transmission electron microscope Electron gun is a LaB6 filament Accelerating voltages include 80 kV 100 kV 120 kV 160 kV and 200 kV Magnifications range from 1000X to 800000X Selective area diffrac- tion camera length ranges from 15 to 300 cm Specimen tilt angle ranges from -30 to 30 degrees Loading capacity is one specimen at a time Equipped with Bruker Quantax 200 Esprit 1.9 software and Bruker 133 silicon drift EDS detector Capable of EDS mapping with simultaneous STEM imaging.